TDUQL

Leave of Absence: Eligibility, Requirements, and Application Timing

This page explains when a leave of absence is required, who may apply, what documents and approvals are needed, and when applications may be submitted.

When a Leave of Absence Is Required

If you cannot attend classes continuously for at least three months because of illness, injury, or another unavoidable reason, you may apply for a leave of absence. In the applicable cases, you must submit a leave-of-absence application and obtain permission before taking leave. This rule is supported for the Faculty of Science and Technology at Saitama Hatoyama Campus in academic years 2025 and 2026, the Faculty of Engineering and Future Science at Tokyo Senju Campus in academic year 2025, and the Faculty of Engineering at Tokyo Senju Campus in academic year 2026. It is also stated for Future Science at Tokyo Senju Campus in academic year 2026.

Application Documents and Approval

For the Faculty of System Design and Engineering at Tokyo Senju Campus in academic year 2025, and the Faculty of Science and Technology at Saitama Hatoyama Campus in academic year 2026, a student who cannot attend continuously for at least three months because of illness or another unavoidable reason may apply for a leave of absence. The application must include either a physician's medical certificate or a written statement explaining the reason. It must also be countersigned by the guarantor and approved by the faculty dean.

Application Timing

For the Faculty of Science and Technology at Saitama Hatoyama Campus in academic year 2026, a leave-of-absence request may be made only within the tuition payment deadline. For the Faculty of System Design and Engineering at Tokyo Senju Campus in academic year 2026, an application for a full academic-year leave covering both the first and second semesters is possible only during the application period for the preceding semester.

Official sources

The following official Tokyo Denki University materials were used to prepare this page.